发明名称 Method of and system for forming a microscopic structure on a substrate using a mask formed on this substrate
摘要 Improved method of and system for substrate micromachining is described. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.
申请公布号 EP2191927(B1) 申请公布日期 2014.01.08
申请号 EP20090176974 申请日期 2009.11.25
申请人 FEI COMPANY 发明人 STRAW, MARCUS;TOTH, MILOS;UTLAUT, MARK;RANDOLPH, STEVEN;LYSAGHT, MICHAEL
分类号 B23K26/18;B23K26/06;B23K26/36;G03F7/004;G03F7/20 主分类号 B23K26/18
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