| 摘要 |
<p>Provided is a photosensitive resin composition for forming a partition wall by a photolithography method, which is capable of forming a pattern with high resolution by improving adhesion of the pattern during the development. Also provided are: a partition wall which is formed as a pattern with high resolution; a color filter with high resolution, which uses the partition wall; and an organic EL element which uses the partition wall. Specifically provided are: a photosensitive resin composition for forming a partition wall by a photolithography method, said partition wall being arranged on a substrate so as to define a plurality of sections for the formation of pixels, which contains (A) a binder resin, (B) a photoactive agent, (C) fine particles that have a zeta potential of from -100 mV to -5 mV in a dispersion liquid as determined by an electrophoretic light scattering method, and (D) an organic solvent; a partition wall which is formed using this composition; a color filter which comprises the partition wall; and an organic EL element which comprises the partition wall.</p> |
