| 摘要 |
<p>A sample having a mesa unit where a pattern is formed is mounted on a Z table, and an optical system irradiates the mesa unit with light and receives the reflected light from the mesa unit in order to measure the height of the mesa unit. A height map of the mesa unit is developed by the height of the circumference of the mesa unit. Based on a deviation between the height measurement value and a target value of the mesa unit, and a variation over time of the light irradiated to the mesa unit, the height of the mesa unit obtained from the height map is calibrated. Based on the calibrated height of the mesa unit, an optical image of the pattern is obtained while controlling the position of the Z table. A defect is determined when the difference value between the compared results of the optical image and the reference image exceeds a fixed threshold value. [Reference numerals] (AA) Height measurement; (BB,DD) Height data; (CC) Z map development; (EE) Atmospheric pressure information; (FF) Height calibration; (GG) Z table operation; (HH) Obtain optical image; (II) Design pattern data; (JJ) Result output; (S11) Optical image obtainment process; (S2) Memory process; (S3) Development process; (S4) Filter treatment process; (S5) Comparison process</p> |
