发明名称 APPARATUS FOR HEAT TREATING AN OPTICAL CERAMIC MATERIAL, METHOD FOR HEAT TREATING AN OPTICAL CERAMIC MATERIAL, METHOD FOR HEAT TREATING SYNTHETIC SILICA GLASS, METHOD FOR PRODUCING AN OPTICAL SYSTEM, AND METHOD FOR PRODUCING AN EXPOSURE APPARATUS
摘要 An optical ceramic material heat treatment apparatus, comprising: a furnace body that is capable to contain an optical ceramic material to be heat treated in the inside thereof; a temperature drop control heater that generates heat during dropping a temperature of the optical ceramic material; a refrigerant intake unit that introduces a refrigerant into the inside of the furnace body to flow the refrigerant therein; and a control unit that controls the temperature drop rate, wherein the temperature drop control heater is arranged in the inside of the furnace body and/or in the refrigerant intake unit, the control unit controls at least one of an amount of heat generation of the temperature drop control heater, and a flow rate of the refrigerant in the inside of the furnace body to control a temperature drop rate at the optical ceramic material or in the vicinity thereof to be kept in a predetermined profile.
申请公布号 US2014000090(A1) 申请公布日期 2014.01.02
申请号 US201314016568 申请日期 2013.09.03
申请人 NIKON CORPORATION 发明人 HARA YUTA
分类号 C03B25/02 主分类号 C03B25/02
代理机构 代理人
主权项
地址