发明名称 |
Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same |
摘要 |
A topcoat composition to be applied on a resist film is provided, the topcoat composition including: (A) an alkali-soluble resin; (B) a compound containing at least one of an Si atom and an F atom, and increasing a contact angle on a surface of the topcoat film; and (C) a solvent. |
申请公布号 |
US8618217(B2) |
申请公布日期 |
2013.12.31 |
申请号 |
US20080271510 |
申请日期 |
2008.11.14 |
申请人 |
KANNA SHINICHI;FUJIFILM CORPORATION |
发明人 |
KANNA SHINICHI |
分类号 |
C08L25/14;C08L27/12;C08L33/10;C08L33/16;C08L33/20;C08L33/26;C08L35/06;C08L43/04;C08L83/06;G03F7/004;G03F7/09 |
主分类号 |
C08L25/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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