| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an applying and developing device capable of automatically cleaning a conveying arm for conveying a substrate, thereby reducing pollution of the substrate. <P>SOLUTION: The applying and developing device includes: a cleaning module 100 which supplies a cleaning liquid or chemical to a wafer W to process it and includes a bevel portion cleaning nozzle 72; a cleaning wafer 6 which includes a bevel portion held by substrate mounting member cut pieces 55a, 55b and 55c of an IF arm A5 to transfer contaminants sticking on the substrate mounting member cut pieces 55a, 55b and 55c, and is stored in a cleaning tool mount rack C2; and a control unit 110 which performs control to let the IF arm A5 hold the cleaning wafer 6 whose bevel portion is cleaned by the cleaning module 100. Thus, the IF arm A5 is automatically cleaned by the cleaning module 100 for the wafer W by transferring the contaminants on the substrate mounting member cut pieces 55a, 55b and 55c to the cleaning wafer 6. <P>COPYRIGHT: (C)2010,JPO&INPIT |
