| 摘要 |
The present invention relates to a wafer processing apparatus that includes a susceptor mounted on a substrate; a process chamber for performing a process with regards to the substrate; a load lock chamber combined with the lower part of the process chamber; a boating part supporting the susceptor to move the susceptor up and down between the load lock chamber and the process chamber. The process chamber includes a chamber body arranged on the upper part of the load lock chamber; and a first partition part dividing an external chamber for accommodating a protection gas from an internal chamber for performing a process and accommodating a reaction gas and vertically combining with the inner part of a chamber body. [Reference numerals] (430) Lift driving part |
