| 摘要 |
PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition which allows formation of patterns with few blob defects and has excellent temporal stability as a liquid resist; and a resist film, a pattern formation method, an electronic device manufacturing method and an electronic device using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin whose solubility in an alkaline developer increases by the action of an acid, (B) a compound which generates an acid upon exposure to an actinic ray or radiation, (C) a compound with groups located on nitrogen atoms and leaving by the action of an acid, and (D) a resin having a partial structure represented by general formula (A). In the general formula (A), Rrepresents a fluorine atom-substituted hydrocarbon group. |
