| 摘要 |
A substrate (1) on which metal layers (2A, 2B) are disposed with a gap therebetween is immersed in an electroless plating solution in which a reducing agent and surfactant are mixed into an electrolyte containing metal ions. The metal ions are reduced by the reducing agent, and while the metal is deposited on the metal layers (2A, 2B), the surfactant adheres to the surface of the metal, and electrodes (4A, 4B), wherein the gap length is controlled to a nanometer size, are formed. Thus, a method for fabricating an electrode structure having a nanogap gap length such that the variations in gap length can be controlled, an electrode structure having a nanogap length in which variations in gap length are suppressed using this fabrication method, and a nanodevice provided with the same are provided. |
