| 摘要 |
The present invention relates to a substrate treating device. The substrate treating device according to an embodiment of the present invention includes a container providing a space in which a supercritical fluid flows or is housed; a recovery pipe, one end of which is connected to the container to discharge the supercritical fluid in the container, providing a valve; and a waste pipe connected to the container to discharge the supercritical fluid in the container and providing a safety valve, wherein the other end of the recovery pipe is connected to a recovery container, which houses the supercritical fluid discharged from the container for reusing the fluid. |
