| 摘要 |
PROBLEM TO BE SOLVED: To solve such problems that it is required to change the inclination of a sample stage or the installation direction of a sample in order to change the observation direction of a sample by an SEM, that the inclination range is limited by stage interference or sample size when inclining the sample stage, and thereby the observation direction may not be changed, and that since the replacement work of a sample requires a work time for replacement, smooth observation is impossible, and thereby the observation direction of a sample cannot be changed easily in the prior art.SOLUTION: The charged particle beam device includes a mirror surface generation mechanism for generating a mirror surface for reflecting a charged particle beam in a direction different from the incident direction, by means of an electrode for applying a voltage higher than the acceleration voltage of the charged particle beam, and deflection means for deflecting the charged particle beam in the direction of the electrode. |
