发明名称 METHOD FOR PRODUCING GROUP-III NITRIDE SEMICONDUCTOR CRYSTAL, GROUP-III NITRIDE SEMICONDUCTOR SUBSTRATE, AND SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 The method for producing a group III nitride semiconductor crystal comprises preparing a seed crystal having a non-polar plane followed by growing a group III nitride semiconductor from the non-polar plane in a vapor phase, wherein the growing includes growing the group III nitride semiconductor so as to extend in the +C-axis direction of the seed crystal. A group III-V nitride semiconductor crystal having high quality and a large-area non-polar plane can be obtained by the method.
申请公布号 US2013320394(A1) 申请公布日期 2013.12.05
申请号 US201313932249 申请日期 2013.07.01
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 FUJITO KENJI;KIYOMI KAZUMASA
分类号 H01L33/18;H01L33/16;H01L33/32 主分类号 H01L33/18
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