| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive base material composition for forming a light shielding layer, which causes no pin hole and is high quality.SOLUTION: In a method of producing a photosensitive base material composition for forming a light shielding layer, a surfactant component (H) that is a polymer with a mass average molecular weight of 10000-50000 is diluted to 2.5-10 mass%, and then filtered. The filtered surfactant component (H), a photosensitive base material component (A), a pigment component (G), and an organic solvent component (S) are dispersed. Preferably, the filtering is conducted with a PTFE film whose pore size is equal to or less than 1 μm. |
