SHUTTER FOR VACUUM CHABER

摘要

The present invention relates to a shutter device for a vacuum chamber and, more specifically, comprises a shutter frame which is formed inside a chamber for sputtering and has a through-hole part at the center part; multiple shutter pieces which open or block the front of the through-hole part of the shutter frame when viewed in the direction of the open part of the through-hole part, have each one end part to overlap with each other and installation holes communicating with each other, block the through-hole part by successively proceeding while rotating in one direction around an axis passing through a central point of each installation hole, and open the through-hole part by being folded to overlap successively by rotating in the other direction; a rotation control part which is formed between the adjacent shutter pieces, successively moves the corresponding shutter piece or limits the rotation angle of the corresponding shutter piece to successively fold the shutter piece; and a driving part with one end part rotated by being installed at the shutter frame and installed at the installation holes and an end part fixed to the shutter piece located at the outermost based on the shutter frame to rotate the shutter piece. When the shutter piece located at the outermost is rotated by the driving unit, other adjacent shutter pieces are successively rotated by the rotation control part, and the shutter pieces proceed or are folded to open or block the front of the through-hole part of the shutter frame.