| 摘要 |
The present invention provides an apparatus for analyzing a processing gas element in a processing chamber by analyzing the spectrum of the processing gas with a photodiode on a substrate with a wafer size. A processing gas analyzing apparatus in the processing chamber includes a plate which is received on the upper surface of a chuck in the processing chamber filled with the processing gas, a plurality of photodiodes, and a control unit. The photodiodes are inserted into the upper surface of the plate. One side of the photodiode is upwardly exposed. The control unit is inserted into the plate, is connected to the photodiodes, and analyzes the processing gas. |
