UNDERPOTENTIAL DEPOSITION OF METAL MONOLAYERS FROM IONIC LIQUIDS
摘要
A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value Phis. The non-diffused monolayer deposited on the surface has a second surface work function value Phis that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.
申请公布号
WO2013173007(A1)
申请公布日期
2013.11.21
申请号
WO2013US36083
申请日期
2013.04.11
申请人
UNITED TECHNOLOGIES CORPORATION
发明人
ZHANG, WEILONG;XU, XIAOMEI;CHEN, LEI;JAWOROWSKI, MARK;SANGIOVANNI, JOSEPH J.