发明名称 UNDERPOTENTIAL DEPOSITION OF METAL MONOLAYERS FROM IONIC LIQUIDS
摘要 A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value Phis. The non-diffused monolayer deposited on the surface has a second surface work function value Phis that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.
申请公布号 WO2013173007(A1) 申请公布日期 2013.11.21
申请号 WO2013US36083 申请日期 2013.04.11
申请人 UNITED TECHNOLOGIES CORPORATION 发明人 ZHANG, WEILONG;XU, XIAOMEI;CHEN, LEI;JAWOROWSKI, MARK;SANGIOVANNI, JOSEPH J.
分类号 C23C28/00;C25D11/04;C25D11/18 主分类号 C23C28/00
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