发明名称 GAS DISTRIBUTARY SUPPLY DEVICE FOR SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To achieve the sharp downsizing, cost reduction, and accuracy enhancement of a gas distributary supply device of a semiconductor manufacturing device.SOLUTION: The gas distributary supply device of a semiconductor manufacturing device includes: a control valve 3 constituting a pressure type flow rate control part connected to a process gas inlet 11; a plurality of branch pipe lines 9a and 9n connected in parallel with the downstream side of a gas supply main pipe 8; branch pipe line opening/closing valves 10a and 10n interposed in the respective branch pipe lines; orifices 6a and 6n disposed at the downstream side of the branch pipe line opening/closing valves; a temperature sensor 4 disposed in the neighborhood of a process gas passage between the control valve and the orifices; a pressure sensor 5 disposed in the process gas passage between the control valve and the orifices; and an arithmetic control part 7 constituted of a pressure type flow rate arithmetic control part to which a pressure signal from the pressure sensor and a temperature signal from the temperature sensor are input, which calculates a total flow rate Q of process gas circulating through the orifices, and which outputs a control signal for controlling the control valve to perform an opening/closing operation in a direction in which a difference between the calculated flow rate value and a set flow rate value is decreased to a valve driving part 3a.
申请公布号 JP2013232101(A) 申请公布日期 2013.11.14
申请号 JP20120103857 申请日期 2012.04.27
申请人 FUJIKIN INC 发明人 NISHINO KOJI;DOI RYOSUKE;HIRATA KAORU;SUGITA KATSUYUKI;IKEDA SHINICHI
分类号 G05D7/06 主分类号 G05D7/06
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