发明名称 SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL
摘要 The present disclosure describes a method of coating a substrate, the method including forming a layer of sputtered material on the substrate. Forming the layer of sputtered material may include: sputtering material from at least one rotatable target over the substrate; varying the relative position between the at least one target and the substrate. In addition, the present disclosure describes varying the distance between a target and a substrate during the sputter process. The present disclosure further describes a system for coating a substrate.
申请公布号 US2013284590(A1) 申请公布日期 2013.10.31
申请号 US201113876826 申请日期 2011.07.22
申请人 BENDER MARCUS;HANIKA MARKUS;SCHEER EVELYN;PIERALISI FABIO;MAHNKE GUIDO;LINDENBERG RALPH;LOPP ANDREAS;SCHWANITZ KONRAD;LIU JIAN;APPLIED MATERIALS, INC. 发明人 BENDER MARCUS;HANIKA MARKUS;SCHEER EVELYN;PIERALISI FABIO;MAHNKE GUIDO;LINDENBERG RALPH;LOPP ANDREAS;SCHWANITZ KONRAD;LIU JIAN
分类号 C23C14/35 主分类号 C23C14/35
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