| 发明名称 |
NEW COMPOUND, RESIST COMPOUND, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound capable of attaining a pattern having low line edge roughness in high sensitivity and high resolution, a negative resist composition using the compound, and a method for producing a resist pattern.SOLUTION: This invention relates to a compound represented by chemical formula (1) and its use. |
| 申请公布号 |
JP2013220995(A) |
申请公布日期 |
2013.10.28 |
| 申请号 |
JP20120091798 |
申请日期 |
2012.04.13 |
| 申请人 |
DAINIPPON PRINTING CO LTD;MITSUBISHI GAS CHEMICAL CO INC |
发明人 |
OKUYAMA KENICHI |
| 分类号 |
C07C39/12;C07C43/23;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C07C39/12 |
| 代理机构 |
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