发明名称 PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a processing device capable of stopping the operation of a device when a processing defect occurs in a ground and polished wafer.SOLUTION: A processing device includes: wafer holding means 4 for holding a wafer; grinding means 5, 50 for grinding a wafer held by the wafer holding means 4; polishing means 7 for polishing a wafer held by the wafer holding means 4; cleaning means 130 for cleaning a ground and polished wafer; processing state detection means 8, 9 for detecting the processing state of a wafer where grinding, polishing and cleaning are terminated; and control means for controlling the respective means on the basis of detection signals from the processing state detection means 8, 9. The control means determines the quality of a processing state of a wafer on the basis of detection signals from the processing state detection means 8, 9, outputs a processing defect message to alarm means when a processing defect is determined, and also stops the operation of the respective means.
申请公布号 JP2013222712(A) 申请公布日期 2013.10.28
申请号 JP20120091159 申请日期 2012.04.12
申请人 DISCO ABRASIVE SYST LTD 发明人 MIZOMOTO YASUTAKA
分类号 H01L21/304 主分类号 H01L21/304
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