发明名称 PRECURSORS FOR DEPOSITING GROUP 4 METAL-CONTAINING FILMS
摘要 PROBLEM TO BE SOLVED: To provide a Group 4 metal-containing precursor for manufacturing a metal oxide improved in process reproducibility.SOLUTION: A Group 4 metal-containing precursor is represented by a following formula I (wherein M is a metal chosen from Ti, Zr and Hf; R and Rare each selected independently from an alkyl group comprising from 1 to 10 carbon atoms; and Rand Rare different alkyl groups).
申请公布号 JP2013219376(A) 申请公布日期 2013.10.24
申请号 JP20130112557 申请日期 2013.05.29
申请人 AIR PRODUCTS & CHEMICALS INC 发明人 LEI XINJIAN;SPENCE DANIEL P;KIM MOO-SUNG;BUCHANAN IAIN;MATZ LAURA M;IVANOV SERGEI VLADIMIROVICH
分类号 H01L21/316;C23C16/40 主分类号 H01L21/316
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