发明名称 |
PRECURSORS FOR DEPOSITING GROUP 4 METAL-CONTAINING FILMS |
摘要 |
PROBLEM TO BE SOLVED: To provide a Group 4 metal-containing precursor for manufacturing a metal oxide improved in process reproducibility.SOLUTION: A Group 4 metal-containing precursor is represented by a following formula I (wherein M is a metal chosen from Ti, Zr and Hf; R and Rare each selected independently from an alkyl group comprising from 1 to 10 carbon atoms; and Rand Rare different alkyl groups). |
申请公布号 |
JP2013219376(A) |
申请公布日期 |
2013.10.24 |
申请号 |
JP20130112557 |
申请日期 |
2013.05.29 |
申请人 |
AIR PRODUCTS & CHEMICALS INC |
发明人 |
LEI XINJIAN;SPENCE DANIEL P;KIM MOO-SUNG;BUCHANAN IAIN;MATZ LAURA M;IVANOV SERGEI VLADIMIROVICH |
分类号 |
H01L21/316;C23C16/40 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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