METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING LIGHT-EMITTING ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern by which a resist pattern having an eaves-like portion can be formed with high accuracy and unintentional residue of the resist can be suppressed.SOLUTION: The method for forming a resist pattern includes: a first step of disposing a first mask 30 having a predetermined opening on a positive resist film 20 and exposing the resist film 20 to a depth not reaching the lower face of the resist film; a second step of heat treating the resist film 20 to insolubilize an exposed region 21; a third step of disposing a second mask 40 on the resist film 20 to cover a region smaller than the insolubilized region 23 and exposing the resist film 20 to a depth reaching the lower face of the resist film; and a fourth step of removing a region other than the region 23 insolubilized in the second step and a region 22 not exposed in the third step.