| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist composition that has excellent lithographic performance with MEEF, DOF, LWR or the like as indices, in addition to excellent basic properties such as sensitivity.SOLUTION: A photosensitive composition contains a polymer component composed of a structural unit represented by formula (1) and a structural unit represented by formula (2), an acid generator, and a triphenylsulfonium compound. |
