| 摘要 |
Disclosed is a dry cleaning method for removing a composition represented by a compositional formula of Mg a Zn b OH c (0‰¤a‰¤1, 0‰¤b‰¤1, 0‰¤c‰¤1, and 0.5‰¤a+b‰¤1), which accumulates in a film formation chamber or in an exhaust pipe of an apparatus for forming a composition represented by a compositional formula of Mg X Zn 1-X O (0‰¤x‰¤1) into a film, by using a cleaning gas. This method is characterized by that a cleaning gas containing ²-diketone is used and that the composition is removed by reacting the composition accumulated with the cleaning gas at a temperature of from 100 °C to 400 °C. It is possible by this method to remove the composition without opening the apparatus. |
