发明名称 Lithographic apparatus and device manufacturing method
摘要 <p>A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and a sensor is filled with a liquid. <IMAGE></p>
申请公布号 EP1486828(B1) 申请公布日期 2013.10.09
申请号 EP20040253354 申请日期 2004.06.04
申请人 ASML NETHERLANDS B.V. 发明人 LOF, JOERI;BIJLAART, ERIK THEODORUS MARIA;BUTLER, HANS;DONDERS, SJOERD NICOLAAS LAMBURTUS;HOOGENDAM, CHRISTIAAN ALEXANDER;KOLESNYCHENKO, ALEKSEY;LOOPSTRA, ERIK ROELOF;MEIJER, HENDRICUS JOHANNES MARIA;MERTENS, JEROEN JOHANNES SOPHIA MARIA;VAN DE KERKHOF, MARCUS ADRIANUS;MULKENS, JOHANNES CATHARINUS HUBERTUS;RITSEMA, ROELOF AEIKO SIEBRAND;VAN SCHAIK, FRANK;SENGERS, TIMOTHEUS FRANCISCUS;SIMON, KLAUS;DE SMIT, JOANNES THEODOOR;STRAAIJER, ALEXANDER;STREEFKERK, BOB;VAN SANTEN, HELMAR;KROON, MARK;DEN BOEF, ARIE JEFFREY;OTTENS, JOOST JEROEN
分类号 G03F7/20;G03F9/00 主分类号 G03F7/20
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