| 摘要 |
PURPOSE: A ceramic heater, a heater electrode, and a method of manufacturing the ceramic heater prevent the deformation of the heater electrode by laminating ceramic calcined bodies. CONSTITUTION: A member (1) for a semiconductor manufacturing device includes an electrostatic chuck (10), and a cooling plate (18). The electrostatic chuck absorbs a silicon wafer (W) which is to be subjected to plasma processing. The cooling plate is disposed on the back side of the electrostatic chuck and serves as a support. A ceramic heater includes an alumina ceramic substrate (12) and a heater electrode (14). The heater electrode is embedded in the alumina ceramic substrate and is made of molybdenum for containing titanium components. The heater electrode is formed to disperse a complex oxide (Ti-Al-Mg-O) of titanium, aluminum, and magnesium in the molybdenum. |
