发明名称 |
Monolithic aluminum alloy target and method of manufacturing |
摘要 |
Aluminum or aluminum alloy sputter targets and methods of making same are provided. The pure aluminum or aluminum alloy is mechanically worked to produce a circular blank, and then the blank is given a recrystallization anneal to achieve desirable grain size and crystallographic texture. A 10-50% additional strain is provided to the blank step after the annealing to increase the mechanical strength. Further, in a flange area of the target, the strain is greater than in the other target areas with the strain in the flange area being imparted at a rate of about 20-60% strain. The blank is then finished to form a sputtering target with desirable crystallographic texture and adequate mechanical strength.
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申请公布号 |
US8551267(B2) |
申请公布日期 |
2013.10.08 |
申请号 |
US20100736311 |
申请日期 |
2010.01.06 |
申请人 |
MIAO WEIFANG;SMATHERS DAVID B.;BAILEY ROBERT S.;TOSOH SMD, INC. |
发明人 |
MIAO WEIFANG;SMATHERS DAVID B.;BAILEY ROBERT S. |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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地址 |
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