发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To satisfy both of inhibition of resin leakage at the time of forming an encapsulation resin and inhibition of damages on a functional wiring area of a wiring board.SOLUTION: A semiconductor device manufacturing method comprises a process of mold clamping a wiring board 57 with a first die 52 and a second die 51. The second die 51 includes a flat part 60 contacting the wiring board 57, a recess 53 which forms a cavity for encapsulation resin formation, and a projection 23 which is formed at a position on the flat part 60 and away from the recess 53 and which projects on the first die 52 side and extends along a first side of the wiring board 57.
申请公布号 JP2013206947(A) 申请公布日期 2013.10.07
申请号 JP20120071563 申请日期 2012.03.27
申请人 RENESAS ELECTRONICS CORP 发明人 NODA TAKAMITSU
分类号 H01L21/56;H01L23/12;H01L23/29;H01L23/31 主分类号 H01L21/56
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