发明名称 Method For Manufacturing A Thin Film On A Substrate
摘要 A method for maufacturing a thin film on a substrate may include: coupling the substrate to a pretensioning facility such that the substrate with the pretensioning facility is isotropically extended in the surface, wherein the substrate is held elastically under pressure with a predetermined pretension; depositing a thin film material on the substrate with a deposition method, in which by applying heat to the thin film material, this is deposited on the substrate so that a thin film with the thin film material is embodied on the substrate; decoupling the substrate from the pretensioning facility; cooling the thin film accompanied by a shrinkage, wherein the predetermined pretension is at least high enough that the appearance of a tensile stress in the thin film is prevented in the case of shrinkage.
申请公布号 US2013260026(A1) 申请公布日期 2013.10.03
申请号 US201313851143 申请日期 2013.03.27
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 PITZER DANA;SCHREITER MATTHIAS;SCHUH CARSTEN;STEINKOPFF THORSTEN
分类号 C23C16/40 主分类号 C23C16/40
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