PURPOSE: A manufacturing method of a photomask is provided to manufacture a photomask by using an organic metal compound ink which self-generates microparticles by heating, thereby manufacturing a photomask in a standby state without using high cost vacuum apparatus. CONSTITUTION: A manufacturing method of a photomask comprises a step of forming a solution layer (20) by coating a base substrate (10) with an organic metal compound ink; a step of self-generating microparticles (25) on the solution layer by heat-treating the base substrate with the solution layer formed; a step of forming a metal pattern by irradiating the solution layer with laser; a step of cleansing the solution layer with the metal pattern formed; and a step of covering the metal pattern with a protection part.
申请公布号
KR20130106677(A)
申请公布日期
2013.09.30
申请号
KR20120028402
申请日期
2012.03.20
申请人
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人
YANG, MIN YANG;KANG, BONG CHUL;YOUN, JIN HO;LEE, HU SEUNG