| 摘要 |
PURPOSE: A substrate processing apparatus is provided to minimize defects due to the temperature difference of chemical solutions by simultaneously coating the upper and lower surfaces of a substrate with the chemical solutions. CONSTITUTION: A spray nozzle module (200) sprays chemical solutions to coat the upper surface of a substrate (1). A coating roller coats the lower surface of the substrate with the chemical solutions. A chemical solution supplying unit (300) is arranged on the lower surface of the coating roller. A chemical solution storage tank (500) stores the chemical solutions to coat the substrate. A bubble preventing unit (400) prevents bubbles in the chemical solutions which are inputted to the chemical storage tank. |
