发明名称 |
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE |
摘要 |
In exposing substrate P by projecting an image of a pattern onto substrate P via projection optical system PL and liquid 1, side surface PB and underside surface PC of substrate P are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided. |
申请公布号 |
KR20130102645(A) |
申请公布日期 |
2013.09.17 |
申请号 |
KR20137020081 |
申请日期 |
2004.06.11 |
申请人 |
NIKON CORPORATION |
发明人 |
OWA SOICHI;MAGOME NOBUTAKA;HIRUKAWA SHIGERU;KUDO YOSHIHIKO;INOUE JIRO;KOHNO HIROTAKA;NEI MASAHIRO;IMAI MOTOKATSU;NAGASAKA HIROYUKI;SHIRAISHI KENICHI;NISHII YASUFUMI;TAKAIWA HIROAKI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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