| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam device in which a beam is made incident vertically to a sample without performing an adjustment or the like using any other deflector than a deflector for visual field movement.SOLUTION: A charged particle beam device is provided which comprises a deflector which moves a scan area of a charged particle beam emitted from a charged particle source and a sample stage for moving a sample. In the charged particle beam device, the sample is moved by the sample stage so as to position the scan area in a location deviated from a target visual field by a predetermined amount and after the sample is moved, the sample stage and the deflector are controlled so as to position the scan area to the target visual field through the deflector. |
