| 摘要 |
<p>A ferromagnetic material sputtering target containing a matrix phase comprising cobalt, cobalt and chrome, cobalt and platinum, or cobalt, chrome and platinum, and an oxide phase including at least a chrome oxide. The ferromagnetic sputtering target is characterized by containing a total content of 10-3,000 wt ppm of at least one type from among Y, Mg, and Al, and by having a relative density of at least 97%. The present invention addresses the problem of providing a ferromagnetic material sputtering target that maintains a high density, uniformly miniaturizes oxide phase particles, and contains a chrome oxide having little generation of particles.</p> |
