| 摘要 |
PROBLEM TO BE SOLVED: To provide a multi-gradation gradation mask that allows comparatively easy design of transmissivity, and is manufacturable with comparatively easy processes without a need of a plurality of etching techniques.SOLUTION: A gradation mask includes: a transparent substrate; a shading film formed in pattern on the transparent substrate; and a semitransparent film having a transmissivity adjustment function. The gradation mask further includes: a transparent region having only the transparent substrate; a shading region having a main pattern of the shading film therein on the transparent substrate; and a third semitransparent region having an auxiliary pattern of the shading film and a pattern of the semitransparent film provided on the transparent substrate. In the third semitransparent region, at least one of an opening and the auxiliary pattern of the shading film has a size equal to or smaller than a resolution limit, the semitransparent film is formed on the transparent substrate at an opening of the auxiliary pattern of the shading film, and the auxiliary pattern of the shading film is a slit. |
