| 摘要 |
<p>A surface coating 20 is applied to a photosensitive material 18, such as a photo-resist on a substrate 12, where the photosensitive material, before or after curing, and surface coating are both soluble in a first liquid. The first liquid is preferably an organic solvent and is used to remove the material / photo-resist and the coating after it has been exposed to radiation via a mask 22. Preferably this leaves a pattern 24 of cured / exposed photo-resist 24 on the substrate. To apply the coating material, it is provided as a dispersion in a second liquid, such as water and preferably as an aqueous solution, in which the photosensitive material is insoluble. Thus the photosensitive material / resist is not disrupted during the top coating. The coating provides protection, is inert, and is preferably a thin polymer film and may comprise polyesters and/or acrylic polymers and copolymers. The coating may also include additives which might include one or more surfactants.</p> |
