发明名称 |
PROCESS FOR THE MANUFACTURE OF AT LEAST ONE ETHYLENE DERIVATIVE COMPOUND |
摘要 |
Process for the manufacture of at least one ethylene derivative compound starting from a low value residual gas, preferably a ROG, according to which: a) the low value residual gas is subjected to a series of treatment steps in a low value residual gas recovery unit in order to remove the undesirable components present therein and to obtain a mixture of products containing ethylene and other constituents; b) the said mixture of products is separated into a fraction enriched with compounds which are lighter than ethylene, containing part of the ethylene (fraction A), into a fraction enriched with ethylene (fraction B) and into a heavy fraction (fraction C); c) fraction A and fraction B are separately conveyed to the manufacture of at least one ethylene derivative compound. |
申请公布号 |
UA102843(C2) |
申请公布日期 |
2013.08.27 |
申请号 |
UA20100011509 |
申请日期 |
2009.02.20 |
申请人 |
SOLVAY (SOCIETE ANONYME) |
发明人 |
PETITJEAN, ANDRE;LEMPEREUR, MICHEL;BALTHASART, DOMINIQUE;STREBELLE, MICHEL;GIANSANTE, MASSIMO |
分类号 |
C07C17/02;C07C17/156;C07C17/25 |
主分类号 |
C07C17/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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