FABRICATION METHOD AND APPARATUS OF FREESTANDING NANOFILM

摘要

PURPOSE: A manufacturing method of freestanding nano-films configured to prevent damage to a freestanding graphene formed on a through hole on a substrate is provided to easily produce a freestanding graphene with large area. CONSTITUTION: A manufacturing method of freestanding nano-films comprises the steps of: a first step in which one side of a polymer layer (300) is transcribed for a nano thin-film to be attached on the upper side of a substrate (100) with a through hole passing through the top and the bottom of a laminate having nano thin-film on one side of the laminate, a second step in which nano thin-film is formed on the upper side of the substrate, has a polymer layer on the upper side and the substrate is turned for the polymer layer to on the lower part, and a third step in which a solvent (600) contacts the polymer layer to remove the polymer layer for the solvent not to be inserted into the through hole of the substrate. The nano thin-film promotes drying of the transcribed substrate. The nano thin-film is a graphene layer (200) which is synthesized through the chemical vapor deposition (CVD).