发明名称 |
REDUCTION OF COPPER OR TRACE METAL CONTAMINANTS IN PLASMA ELECTROLYTIC OXIDATION COATINGS |
摘要 |
A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer. |
申请公布号 |
KR20130092538(A) |
申请公布日期 |
2013.08.20 |
申请号 |
KR20137000068 |
申请日期 |
2011.06.01 |
申请人 |
MKS INSTRUMENTS, INC. |
发明人 |
CHEN XING;JI CHENGXIANG;TAI CHIU YING |
分类号 |
C25D5/48;C23C16/44;C25D11/04;H01J37/16 |
主分类号 |
C25D5/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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