| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique advantageous to pattern transferring accuracy in an imprint device.SOLUTION: The imprint device comprises: a deformation section for applying a first force to a mold and deforming a pattern face; a first measuring section for measuring a deformation amount of the pattern face; a control section for performing a control to measure the deformation amount of the pattern face by the first measuring section in each of plural states under which the plural first forces are applied to the mold by the deformation section; a calculation section for calculating a change rate of the deformation amount of the pattern face from a relationship between each of the plural first forces applied to the mold and the pattern face; and a calibration section for calibrating a first control profile indicating a relationship between a time during imprint processing and the first force to be applied to the mold by the deformation section so that the deformation amount of the pattern face during the imprint processing reaches a target amount based on the change rate of the deformation amount of the pattern face calculated by the calculation section. |
