METHOD FOR MICRO METAL MESH STRUCTURE

摘要

PURPOSE: A method for manufacturing a micro metal mesh structure is provided to utilize a silicon substrate as a sacrificial layer, thereby manufacturing the micro metal mesh structure released from the substrate. CONSTITUTION: A method for manufacturing a micro metal mesh structure includes the following steps of: forming an oxide layer (120) on the top of a silicon substrate (110); forming a mesh pattern unit (130) and a supporting unit (140) by etching the oxide layer; forming a support post (111) under the mesh pattern unit and the supporting unit by vertically etching the silicon substrate which is exposed to the outside by the etching of the oxide layer; wet-etching the support post and depositing a metallic foil (150) on the surface of the manufactured structure; removing the support post positioned under the mesh pattern unit; and forming the mesh pattern unit into a tube shape by rolling the mesh pattern unit toward the supporting unit with the foil stress.