| 摘要 |
A position detecting apparatus includes a light source, which supplies a detecting light; a light-collecting optical system which collects the detecting light onto a diffracted light generating portion provided on the object; a light guiding optical system which guides, to a predetermined position, a diffracted measuring light generated from the diffracted light generating portion by receiving the detecting light and a reference light generated from a reference surface by receiving the detecting light; and a photodetector which is arranged at the predetermined position and which detects interference fringes generated by the diffracted measuring light and the reference light. Three-dimensional positional information of, for example, a mask pattern surface or an exposure surface of a photosensitive substrate can be highly accurately detected by a relatively simple construction.
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