METHOD FOR CONTROLLING ION BEAM IRRADIATION BY PULSE OPERATION

摘要

PURPOSE: A method for controlling the dosage of ion beams is provided to control an average current while maintaining a peak current by controlling a pulse repetition rate or a pulse width according to the dosage of ion beams. CONSTITUTION: A withdrawal electrode surrounds a plasma generating unit. An ion source (10) includes the plasma generating unit, the withdrawal electrode, and a ground electrode. The ground electrode is separated from the withdrawal electrode. A stage (20) is equipped with an emitted object. A power unit (50) applies a voltage to both terminals of the withdrawal electrode and the ground electrode.