| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of restraining exposure failure.SOLUTION: An exposure device exposes a substrate with exposure light via a first liquid. The exposure device comprises: an optical member having an emission face from which the exposure light is emitted; a liquid immersion member arranged at least at one part around an optical path of the exposure light emitted from the emission face, and having a lower face; a holding mechanism releasably holding a cover member so that an upper face of the cover member is opposed to at least one part of the emission face and the lower face in second processing different from first processing including exposure of the substrate; and a recovery port for recovering at least one part of the first liquid supplied to the emission face in the first processing, and recovering at least one part of the second liquid supplied to the emission face in the second processing. A flow of gas into the recovery port in the second processing is restrained lower than a flow of gas into the recovery port in the first processing. |
