发明名称 ANTISTATIC ANTIREFLECTION FILM, METHOD FOR MANUFACTURING ANTISTATIC ANTIREFLECTION FILM, POLARIZING PLATE AND IMAGE DISPLAY APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an antistatic antireflection film which has excellent antireflection properties and antistatic properties and is free from a planar failure and excellent in scratch resistance, abrasion resistance and antifouling properties.SOLUTION: There is provided an antistatic antireflection film which comprises, on a support, a hard coat layer formed of a hard coat layer composition containing at least a compound having a quaternary ammonium salt group and a low refractive index layer formed of a composition for a low refractive index layer containing at least the following (a), (b), (c) and (d) in this order, wherein (a) is a fluorine-containing polymer containing an ethylenically unsaturated group, (b) is a fluorine-containing polyfunctional monomer having a surface free energy of 23 mN/m or more when a film is formed alone, no -CFgroup in the molecule, a fluorine content of 30% or more and at least three reactive functional groups in one molecule, (c) is hollow silica fine particles having an average particle diameter of 10 nm to 100 nm, and (d) is a compound having a dimethylsiloxane skeleton.
申请公布号 JP2013130865(A) 申请公布日期 2013.07.04
申请号 JP20120255494 申请日期 2012.11.21
申请人 FUJIFILM CORP 发明人 WAKIZAKA DAIKI;FUKUDA KENICHI
分类号 G02B1/11;G02B1/10;G02B5/30;G02F1/1335;H01L51/50;H05B33/02 主分类号 G02B1/11
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