发明名称 |
Cleaning sheet, transfer member provided with cleaning function, and method for cleaning substrate processing apparatus |
摘要 |
A cleaning sheet including a cleaning layer which has a microasperity shape having an arithmetic average roughness Ra of 0.05 mum or less and a maximum height Rz of 1.0 mum or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm2. The cleaning sheet may be provided on at least one surface of a transfer member so that the transfer member has a cleaning function. When the cleaning sheet or the transfer member having a cleaning function is transferred in a substrate processing apparatus in place of a substrate to be processed therein, the cleaning sheet contacts and cleans a site of the substrate processing apparatus.
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申请公布号 |
US8475600(B2) |
申请公布日期 |
2013.07.02 |
申请号 |
US20060067235 |
申请日期 |
2006.10.12 |
申请人 |
UENDA DAISUKE;ARIMITSU YUKIO;TERADA YOSHIO;AMANO YASUHIRO;MURATA AKIHISA;NITTO DENKO CORPORATION |
发明人 |
UENDA DAISUKE;ARIMITSU YUKIO;TERADA YOSHIO;AMANO YASUHIRO;MURATA AKIHISA |
分类号 |
B08B7/00;B32B3/30;B32B17/10 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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