| 摘要 |
PURPOSE: A multi-charged particle beam writing apparatus and a multi-charged particle beam writing method are provided to secure high precision by using a multi beam. CONSTITUTION: A stage holds a sample. A discharging part emits a charged particle beam. A detection part(50) detects a fault beam among multi beams. A setting part(51) defines a second region. A writing process control part(52) adjusts a writing process. [Reference numerals] (112) Memory; (130,132) Deflection control circuit; (138) Current detector; (139) Stage position detector; (140) Writing data; (50) Detection processing part; (51) Setting part; (52) Writing process control part; (54) Writing data processing part; (60,62,64) Efficiency calculation part; (66) Determination part; (68) Mode selection part |
