| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exhaust treating apparatus which prolongs the lifetime of an ozone decomposition catalyst, independently of the shape of the column, by uniforming the contact of ozone with the ozone decomposition catalyst. <P>SOLUTION: The exhaust treating apparatus treats exhaust discharged by a semiconductor production apparatus and containing halogens and ozone. The exhaust treating apparatus includes an column, an ozone decomposition catalyst and an agitation means. The column has an inlet through which the exhaust flows in from the semiconductor production apparatus and an outlet through which the exhaust gas flows out and causes the exhaust to flow through it. The ozone decomposition catalyst is granular and is packed between the inlet and outlet of the column to decompose ozone contained in the exhaust. The agitation means agitates the ozone decomposition catalyst packed in the column. <P>COPYRIGHT: (C)2013,JPO&INPIT |
