摘要 |
A method of determining configuration of interferential filtering means for an optical device comprising an optical substrate for a user, the method comprising: providing a first set of parameters representative of at least one main line of sight of the user, the distance between the optical substrate and an eye of the user, a size of a retina area and/or the pupil size of the eye of the user; determining a first selected range of angles of incidence based on the first set of parameters; providing a second set of parameters characterising, for the user, a range of wavelengths to be inhibited, at least partially; determining a first selected range of wavelengths of incident light to be inhibited, at least partially, based on the second set of parameters; and configuring a first selective interferential filtering means and a first zone of a surface of the optical substrate based on the first selected range of angles of incidence and the first selected range of wavelengths such that the first selective interferential filtering means is operable to inhibit, at a first rate of rejection, transmission of the first selected range of wavelengths of incident light, incident on the first zone within the first selected range of angles of incidence. |
申请人 |
ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE);UNIVERSITE PARIS 6 PIERRE ET MARIE CURIE |
发明人 |
COHEN-TANNOUDJI, DENIS;BARRAU, CORALIE;VILLETTE, THIERRY PIERRE;SAHEL, JOSE-ALAIN;PICAUD, SERGE;ARNAULT, EMILIE |