| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cyclic compound represented by a specific chemical structure useful as an acid-amplified non-polymer resist material, a radiation-sensitive composition comprising the same, and a method for forming a resist pattern using the radiation-sensitive composition. <P>SOLUTION: The compound is represented by formula (1) and has a molecular weight of 500-5,000. In the formula, R<SP POS="POST">0</SP>'s are each independently a hydrogen atom, hydroxy group, alkyl group, hydroxyalkyl group, cyclohexylphenyl group, alkylphenyl group or the like. <P>COPYRIGHT: (C)2013,JPO&INPIT |
